Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Abraham Barde; David Lewis; Huda Salam Al-Jurani; Brendan Ward-O'Brien; Mark Buckingham; Robert Cernik

doi:10.1039/D5CC00237K

Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Abraham Barde, David Lewis, Huda Salam Al-Jurani, Brendan Ward-O'Brien, Mark Buckingham, Robert Cernik

Research output: Contribution to journal › Article › peer-review

Abstract

We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded MoxW1−xS2 and WxMo1−xS2 thin films.

Original language	English
Journal	Chemical Communications
Early online date	17 Feb 2025
DOIs	https://doi.org/10.1039/D5CC00237K
Publication status	E-pub ahead of print - 17 Feb 2025

Keywords

Gradient Aerosol Chemical Vapor Deposition (GACVD)
chemical vapor deposition (CVD)
Transition metal disulfides
Thin Films
Vertically Graded Thin Films
Vertical Compositional Gradient

Research Beacons, Institutes and Platforms

Advanced materials

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10.1039/D5CC00237KLicence: CC BY

Cite this

@article{e2556965d30a46748772f84666c32940,

title = "Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2",

abstract = "We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded MoxW1−xS2 and WxMo1−xS2 thin films.",

keywords = "Gradient Aerosol Chemical Vapor Deposition (GACVD), chemical vapor deposition (CVD), Transition metal disulfides, Thin Films, Vertically Graded Thin Films, Vertical Compositional Gradient",

author = "Abraham Barde and David Lewis and Al-Jurani, \{Huda Salam\} and Brendan Ward-O'Brien and Mark Buckingham and Robert Cernik",

year = "2025",

month = feb,

day = "17",

doi = "10.1039/D5CC00237K",

language = "English",

journal = "Chemical Communications",

issn = "1359-7345",

publisher = "Royal Society of Chemistry",

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T1 - Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

AU - Barde, Abraham

AU - Lewis, David

AU - Al-Jurani, Huda Salam

AU - Ward-O'Brien, Brendan

AU - Buckingham, Mark

AU - Cernik, Robert

PY - 2025/2/17

Y1 - 2025/2/17

N2 - We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded MoxW1−xS2 and WxMo1−xS2 thin films.

AB - We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded MoxW1−xS2 and WxMo1−xS2 thin films.

KW - Gradient Aerosol Chemical Vapor Deposition (GACVD)

KW - chemical vapor deposition (CVD)

KW - Transition metal disulfides

KW - Thin Films

KW - Vertically Graded Thin Films

KW - Vertical Compositional Gradient

U2 - 10.1039/D5CC00237K

DO - 10.1039/D5CC00237K

M3 - Article

SN - 1359-7345

JO - Chemical Communications

JF - Chemical Communications

ER -

Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Abstract

Keywords

Research Beacons, Institutes and Platforms

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